Description

Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, Fabrication Engineering at the Micro- and Nanoscale, Fourth Edition, covers the entire basic unit processes used to fabricate integrated circuits and other devices.

With many worked examples and detailed illustrations, this engaging introduction provides the tools needed to understand the frontiers of fabrication processes.

NEW TO THIS EDITION

Coverage of many new topics including:
- the flash and spike annealing processes
- extreme ultraviolet (EUV) lithography
- GaN epitaxial growth and doping
- double exposure routes to sub-35-nm lithography
- architectures for nanoscale CMOS as practiced at the 45-nm node
- trigate or FINFET CMOS planned for 22 nm and below
- bulk silicon and thin film solar cell manufacturing
- GaN LED fabrication
- microfluidics

Updated sections on nonoptical lithography

Expanded content on state-of-the-art CMOS

A Companion Website with PowerPoint slides of figures from the text (www.oup.com/us/campbell)

An Instructor's Solutions Manual, available to registered adopters of the text (978-0-19-986121-7)

Reviews

"This is one of the best texts in the field. It provides the most complete coverage of fabrication techniques."--Xian-An Cao, West Virginia University

"I like Campbell's style and enjoy reading the text. The material is appropriate for the intended audience and there are good summaries of background material."--Trevor Thornton, Arizona State University

About the Author(s)

Companion Resources

The following resources are available from the "Fabrication Engineering at the Micro- and Nanoscale, 4e" companion site: